Article views: 2298 Times PDF downloads: 1111 Times Cited by: 0 Times
Received: 19 August 2015 Revised: Online: Published: 01 September 1994
| Citation: |
牛國富,阮剛. 為SIMOX SOI結構的硅膜和二氧化硅埋層厚度模型[J]. 半導體學報(英文版), 1994, 15(9): 611-616.
|
Journal of Semiconductors © 2017 All Rights Reserved 京ICP備05085259號-2