Chin. J. Semicond. > 1994, Volume 15?>?Issue 9?> 603-610

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    Received: 19 August 2015 Revised: Online: Published: 01 September 1994

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      徐秋霞，龔義元，張建欣，汪鎖發，翦進，海潮和，扈煥章. 自對準Ti－SALICIDE　LDD　MOS工藝研究[J]. 半導體學報(英文版), 1994, 15(9): 603-610.
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      徐秋霞，龔義元，張建欣，汪鎖發，翦進，海潮和，扈煥章. 自對準Ti－SALICIDE　LDD　MOS工藝研究[J]. 半導體學報(英文版), 1994, 15(9): 603-610.

      • Received Date: 2015-08-19

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