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Abstract: Transient characteristic analysis of a CMOS circuit based on a double-gate dual-strained channel SOI MOSFET with the effective gate length scaling down to 25nm is presented.As a result of simulations,by the adoption of a single-gate (SG) control mechanism,the conversion time from logic 1 to logic 0 is shorter for conventional strained-Si CMOS than unstrained CMOS.Furthermore,the conversion time from logic 0 to logic 1 can be reduced by the application of a strained-SiGe CMOS circuit.However,the CMOS circuit based on the novel structure can reduce tHL and tLH simultaneously.By the adoption of a double-gate (DG) control mechanism,the conversion time of the CMOS circuit shows a dramatic reduction compared with the SG control mechanism and the performance of the CMOS circuit can be improved significantly.
Key words: double-gate, dual-strained-channel, CMOS
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Received: 18 August 2015 Revised: 13 March 2008 Online: Published: 01 August 2008
| Citation: |
Sun Liwei, Gao Yong, Yang Yuan, Liu Jing. Transient Characteristic Analysis of a Double-Gate Dual-Strained-Channel SOI CMOS[J]. Journal of Semiconductors, 2008, 29(8): 1566-1569.
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Sun L W, Gao Y, Yang Y, Liu J. Transient Characteristic Analysis of a Double-Gate Dual-Strained-Channel SOI CMOS[J]. J. Semicond., 2008, 29(8): 1566.
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