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Chin. J. Semicond. > 1994, Volume 15?>?Issue 5?> 361-366

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    Received: 18 August 2015 Revised: Online: Published: 01 May 1994

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      徐秋霞，龔義元，張建欣，扈煥章，汪鎖發(fā)，李衛(wèi)寧. TiSi2 Polycide LDD MOS工藝研究[J]. 半導(dǎo)體學(xué)報(bào)(英文版), 1994, 15(5): 361-366.
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      徐秋霞，龔義元，張建欣，扈煥章，汪鎖發(fā)，李衛(wèi)寧. TiSi2 Polycide LDD MOS工藝研究[J]. 半導(dǎo)體學(xué)報(bào)(英文版), 1994, 15(5): 361-366.

      • Received Date: 2015-08-18

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