Chin. J. Semicond. > 1995, Volume 16?>?Issue 3?> 235-240

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    Received: 19 August 2015 Revised: Online: Published: 01 March 1995

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      劉秀喜，趙富賢，薛成山，孫瑛，華士奎. 采用SiO_2／Si系擴鎵提高擴散質量和器件性能的研究[J]. 半導體學報(英文版), 1995, 16(3): 235-240.
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      劉秀喜，趙富賢，薛成山，孫瑛，華士奎. 采用SiO_2／Si系擴鎵提高擴散質量和器件性能的研究[J]. 半導體學報(英文版), 1995, 16(3): 235-240.

      • Received Date: 2015-08-19

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