Chin. J. Semicond. > 1995, Volume 16?>?Issue 3?> 229-234

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    Received: 19 August 2015 Revised: Online: Published: 01 March 1995

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      朱德華，盧紅波，柳百新. 用強流金屬離子源研究Ti－Si化合物的形成[J]. 半導體學報(英文版), 1995, 16(3): 229-234.
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      朱德華，盧紅波，柳百新. 用強流金屬離子源研究Ti－Si化合物的形成[J]. 半導體學報(英文版), 1995, 16(3): 229-234.

      • Received Date: 2015-08-19

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