SEMICONDUCTOR DEVICES
Qing Wang1, 2, Peng Ding2, Yongbo Su2, Wuchang Ding1, 2, Muhammad Asif5, Wu Tang2 and Zhi Jin2
Abstract: The 100-nm T-gate InP-based InAlAs/InGaAs high electron mobility transistors (HEMTs) with the width of 2×50 μm and source-drain space of 2.4 μm are systematically investigated. High indium (In) composition of InGaAs layer was adopted to acquire the higher mobility of the channel layer. A sandwich structure was adopted to optimize the cap layers and produce a very low contact resistance. The fabricated devices exhibit extrinsic maximum transconductance Gm.max=1441 mS/mm, cutoff frequency fT=260 GHz, and maximum oscillation frequency fmax=607 GHz. A semi-empirical model has been developed to precisely fit the low-frequency region of scattering parameters (S parameters) for InP-based HEMTs. Excellent agreement between measured and simulated S parameters demonstrates the validity of this approach.
Key words: high electron mobility transistor, InGaAs layer, semi-empirical model
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. Comparison with published InP HEMTs with gate length of 100 nm.
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. Comparison of error function for the traditional model and the new model, respectively.
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Article views: 3318 Times PDF downloads: 40 Times Cited by: 0 Times
Received: 29 December 2015 Revised: Online: Published: 01 July 2016
| Citation: |
Qing Wang, Peng Ding, Yongbo Su, Wuchang Ding, Muhammad Asif, Wu Tang, Zhi Jin. fT=260 GHz and fmax=607 GHz of 100-nm-gate In0.52Al0.48As/In0.7Ga0.3As HEMTs with Gm.max=1441 mS/mm[J]. Journal of Semiconductors, 2016, 37(7): 074003. doi: 10.1088/1674-4926/37/7/074003
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Q Wang, P Ding, Y B Su, W C Ding, M Asif, W Tang, Z Jin. fT=260 GHz and fmax=607 GHz of 100-nm-gate In0.52Al0.48As/In0.7Ga0.3As HEMTs with Gm.max=1441 mS/mm[J]. J. Semicond., 2016, 37(7): 074003. doi: 10.1088/1674-4926/37/7/074003.
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