Chin. J. Semicond. > 1995, Volume 16?>?Issue 2?> 153-157

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    Received: 19 August 2015 Revised: Online: Published: 01 February 1995

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      黃大定，秦復光，姚振鈺，劉志凱，任治璋，林蘭英，高維濱，任慶余. 用低能離子束淀積技術在硅（111）襯底上生長氧化鈰外延薄膜[J]. 半導體學報(英文版), 1995, 16(2): 153-157.
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      黃大定，秦復光，姚振鈺，劉志凱，任治璋，林蘭英，高維濱，任慶余. 用低能離子束淀積技術在硅（111）襯底上生長氧化鈰外延薄膜[J]. 半導體學報(英文版), 1995, 16(2): 153-157.

      • Received Date: 2015-08-19

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