PAPERS
Zhu Zhen, Huang Qing’an, Li Weihua, Zhou Zaifa and Feng Ming
Abstract: According to a Fresnel diffraction model,and considering the reflection and refraction at the glycerol/SU-8 interface,this paper simulates the aerial image when glycerol is applied between the photomask and resist.Compared to the experimental results,the model can describe the lithography process competently and be applied in design.
Key words: SU-8 photoresist, Fresnel diffraction, glycerol
Article views: 3088 Times PDF downloads: 1567 Times Cited by: 0 Times
Received: 18 August 2015 Revised: 14 July 2007 Online: Published: 01 December 2007
| Citation: |
Zhu Zhen, Huang Qing’an, Li Weihua, Zhou Zaifa, Feng Ming. Simulation of the Diffraction Effect in Exposure on a SU-8 Photoresist and the Glycerol Compensated Method[J]. Journal of Semiconductors, 2007, 28(12): 2011-2017.
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Zhu Z, Huang Q, Li W H, Zhou Z F, Feng M. Simulation of the Diffraction Effect in Exposure on a SU-8 Photoresist and the Glycerol Compensated Method[J]. Chin. J. Semicond., 2007, 28(12): 2011.
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