Chin. J. Semicond. > 1995, Volume 16?>?Issue 4?> 303-308

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真空紫外光直接光CVD法低溫生長SiO_2薄膜及其性質

杜開英，陳義

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    Received: 19 August 2015 Revised: Online: Published: 01 April 1995

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      杜開英，陳義. 真空紫外光直接光CVD法低溫生長SiO_2薄膜及其性質[J]. 半導體學報(英文版), 1995, 16(4): 303-308.
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      杜開英，陳義. 真空紫外光直接光CVD法低溫生長SiO_2薄膜及其性質[J]. 半導體學報(英文版), 1995, 16(4): 303-308.

      • Received Date: 2015-08-19

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