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J. Semicond. > 2008, Volume 29?>?Issue 3?> 559-562

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Impact of Two-Dimension Effects on Threshold Voltage of Fully Depleted SOI MOSFETs with Asymmetric Halos

Xu Jian, Ding Lei, Han Zhengsheng and Zhong Chuanjie

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Abstract: Based on an analytical threshold voltage model of fully depleted silicon-on-insulator (SOI) MOSFETs with asymmetric HALO structures,the impact of the two-dimension effects in a buried-oxide layer on threshold voltage is discussed.Compared to the 1D model,two-dimensional effects in the buried-oxide layer of the deep submicron MOSFET device create the short-channel effect more quickly.The predictions of the new model are in good agreement with those of the two-dimension numerical simulator MEDICI.

Key words: threshold voltagetwo-dimension effectsfully depleted SOIHALO structure

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    Received: 18 August 2015 Revised: 01 November 2007 Online: Published: 01 March 2008

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      Xu Jian, Ding Lei, Han Zhengsheng, Zhong Chuanjie. Impact of Two-Dimension Effects on Threshold Voltage of Fully Depleted SOI MOSFETs with Asymmetric Halos[J]. Journal of Semiconductors, 2008, 29(3): 559-562. ****Xu J, Ding L, Han Z S, Zhong C J. Impact of Two-Dimension Effects on Threshold Voltage of Fully Depleted SOI MOSFETs with Asymmetric Halos[J]. J. Semicond., 2008, 29(3): 559.
      Citation:
      Xu Jian, Ding Lei, Han Zhengsheng, Zhong Chuanjie. Impact of Two-Dimension Effects on Threshold Voltage of Fully Depleted SOI MOSFETs with Asymmetric Halos[J]. Journal of Semiconductors, 2008, 29(3): 559-562. ****
      Xu J, Ding L, Han Z S, Zhong C J. Impact of Two-Dimension Effects on Threshold Voltage of Fully Depleted SOI MOSFETs with Asymmetric Halos[J]. J. Semicond., 2008, 29(3): 559.

      Impact of Two-Dimension Effects on Threshold Voltage of Fully Depleted SOI MOSFETs with Asymmetric Halos

      • Received Date: 2015-08-18
      • Accepted Date: 2007-10-08
      • Revised Date: 2007-11-01
      • Published Date: 2008-02-28

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