J. Semicond. > 2008, Volume 29?>?Issue 11?> 2175-2179

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A Sacrificial Layer Etching Method Applied in Surface Micromachining Using Agitated BHF and Glycerol Solution

Wang Xiaoning, Yang Zhenchuan and Yan Guizhen

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Abstract: A modified buffered-HF solution with NH4F∶glycerol∶HF (4∶2∶1) is studied.With the implementation of a heating and agitating mechanism,this method is applied in a sacrificial layer etching scheme that increases the selectivity between silicon dioxide and aluminum.The etching rates of SiO2 and Al as a function of solution temperature are determined.Moreover,the effects of adding glycerol and agitating the etchant are examined and compared with this method.Finally,this method is tested on an actual device,and its efficiency is scrutinized.

Key words: surface micromachining, sacrificial etching, BHF, glycerol

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    Received: 18 August 2015 Revised: 16 July 2008 Online: Published: 01 November 2008

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      Wang Xiaoning, Yang Zhenchuan, Yan Guizhen. A Sacrificial Layer Etching Method Applied in Surface Micromachining Using Agitated BHF and Glycerol Solution[J]. Journal of Semiconductors, 2008, 29(11): 2175-2179. ****Wang X N, Yang Z C, Yan G Z. A Sacrificial Layer Etching Method Applied in Surface Micromachining Using Agitated BHF and Glycerol Solution[J]. J. Semicond., 2008, 29(11): 2175.
      Citation:
      Wang Xiaoning, Yang Zhenchuan, Yan Guizhen. A Sacrificial Layer Etching Method Applied in Surface Micromachining Using Agitated BHF and Glycerol Solution[J]. Journal of Semiconductors, 2008, 29(11): 2175-2179. ****
      Wang X N, Yang Z C, Yan G Z. A Sacrificial Layer Etching Method Applied in Surface Micromachining Using Agitated BHF and Glycerol Solution[J]. J. Semicond., 2008, 29(11): 2175.

      A Sacrificial Layer Etching Method Applied in Surface Micromachining Using Agitated BHF and Glycerol Solution

      • National Key Laboratory of Micro/Nano Fabrication Technology,Institute of Microelectronics,Peking University,Beijing 100871,China

      • National Key Laboratory of Micro/Nano Fabrication Technology,Institute of Microelectronics,Peking University,Beijing 100871,China

      • National Key Laboratory of Micro/Nano Fabrication Technology,Institute of Microelectronics,Peking University,Beijing 100871,China

      • Received Date: 2015-08-18
      • Accepted Date: 2008-06-08
      • Revised Date: 2008-07-16
      • Published Date: 2008-11-11

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