PAPERS
Abstract: An analytical model of electron mobility for strained-silicon channel nMOSFETs is proposed in this paper.The model deals directly with the strain tensor,and thus is independent of the manufacturing process.It is suitable for 〈100〉/〈110〉 channel nMOSFETs under biaxial or 〈100〉/〈110〉 uniaxial stress and can be implemented in conventional device simulation tools.
Key words: Strained-Si, electron mobility, analytical model, nMOSFET, uniaxial stress/strain
Article views: 3755 Times PDF downloads: 1056 Times Cited by: 0 Times
Received: 18 August 2015 Revised: 09 January 2008 Online: Published: 01 May 2008
| Citation: |
Li Xiaojian, Tan Yaohua, Tian Lilin. An Analytical Model of Electron Mobility for Strained-Si Channel nMOSFETs[J]. Journal of Semiconductors, 2008, 29(5): 863-868.
****
Li X J, Tan Y H, Tian L L. An Analytical Model of Electron Mobility for Strained-Si Channel nMOSFETs[J]. J. Semicond., 2008, 29(5): 863.
|
Journal of Semiconductors © 2017 All Rights Reserved 京ICP備05085259號(hào)-2