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J. Semicond. > 2017, Volume 38?>?Issue 5?> 054007

SEMICONDUCTOR DEVICES

A high-efficiency grating coupler between single-mode fiber and silicon-on-insulator waveguide

Rongrui Liu, Yubing Wang, Dongdong Yin, Han Ye, Xiaohong Yang and Qin Han

+ Author Affiliations

 Corresponding author: Han Qin, Email: hanqin@semi.ac.cn

DOI: 10.1088/1674-4926/38/5/054007

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Abstract: We present the design of a diffractive grating structure and get the optimal parameters which can achieve more than 75% coupling efficiency (CE) between single-mode fiber and silicon-on-insulator (SOI) waveguide through 2D finite-different time-domain (FDTD) simulation. The proposed architecture has a uniform structure with no bottom reflection element or silicon overlay. The structure, including grating couplers, adiabatic tapers and interconnection waveguides can be fabricated on the SOI waveguide with only a single electron-beam lithography (ICP) step, which is CMOS-compatible. A relatively high coupling efficiency of 47.2% was obtained at a wavelength of 1562 nm.

Key words: grating coupler, coupling efficiency, silicon-on-insulator waveguide, single-mode fiber, integrated optics



[1]
Sun C, Wade M T, Lee Y, et al. Single-chip microprocessor that communicates directly using light. Nature, 2015, 528: 534 doi: 10.1038/nature16454
[2]
Michel J, Liu J, Kimerling L C. High-performance Ge-on-Si photodetectors. Nat Photon, 2010, 4: 527 doi: 10.1038/nphoton.2010.157
[3]
Streshinsky M, Ding R, Liu Y, et al. Low power 50 Gb/s silicon traveling wave Mach-Zehnder modulator near 1300 nm. Opt Express, 2013, 21: 30350 doi: 10.1364/OE.21.030350
[4]
Li G, Yao J, Thacker H, et al. Ultralow-loss, high-density SOI optical waveguide routing for macro-chip interconnects. Opt Express, 2012, 20: 12035 doi: 10.1364/OE.20.012035
[5]
Van Laere F, Roelkens G, Ayre M, et al. Compact and highly efficient grating couplers between optical fiber and nanophotonic waveguides. J Lightwave Technol, 2007, 25: 151 doi: 10.1109/JLT.2006.888164
[6]
Taillaert D, Van Laere F, Ayre M, et al. Grating couplers for coupling between optical fibers and nanophotonic waveguides. Jpn J Appl Phys, 2006, 45: 6071 doi: 10.1143/JJAP.45.6071
[7]
Roelkens G, Dumon P, Bogaerts W, et al. Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography. IEEE PTL, 2005, 17: 2613 doi: 10.1109/LPT.2005.859132
[8]
Tsuchizawa T, Yamada K, Fukuda H, et al. Microphotonics devices based on silicon microfabrication technology. IEEE JSTQE, 2005, 11: 232 http://ieeexplore.ieee.org/document/1395912/
[9]
Roelkens G, Van Thourhout D, Baets R, et al. High efficiency silicon-on-insulator grating coupler based on a poly-silicon overlay. Opt Express, 2006, 14: 11622 doi: 10.1364/OE.14.011622
[10]
Vermeulen D, Selvaraja S, Verheyen P, et al. High-efficiency fiber-to-chip grating couplers realized using an advanced CMOS compatible silicon-on-insulator platform. Opt Express, 2014, 18: 18278 https://www.osapublishing.org/oe/abstract.cfm?uri=oe-18-17-18278
[11]
Yang S, Zhang Y, Baehr-Jones T, et al. High efficiency germanium-assisted grating coupler. Opt Express, 2014, 22: 30607 doi: 10.1364/OE.22.030607
[12]
Ding Y, Ou H, Peucheret C, et al. Fully-etched apodized fiber-tochip grating coupler on the SOI platform with-0.78 dB coupling efficiency using photonic crystals and bonded Al mirror. European Conference on Optical Communications, 2014: P.2.4 http://ieeexplore.ieee.org/abstract/document/6963889/
[13]
Ding Y, Peucheret C, Ou H, et al. Fully etched apodized grating coupler on the SOI platform with 0.58 dB coupling efficiency. Opt Lett, 2014, 39: 5348 doi: 10.1364/OL.39.005348
[14]
Zaoui W S, Kunze A, Vogel W, et al. Bridging the gap between optical fibers and silicon photonic integrated circuits. Opt Express, 2014, 22: 1277 doi: 10.1364/OE.22.001277
[15]
Zaoui W S, Kunze A, Vogel W, et al. CMOS-compatible polarization splitting grating couplers with a backside metal mirror. IEEE Photon Technol Lett, 2013, 25: 1395 doi: 10.1109/LPT.2013.2266132
[16]
Benedikovic D, Cheben P, Schmid J H, et al. High-efficiency single etch step apodized surface grating coupler using subwavelength structure. Laser Photonics Rev, 2014, 8: L93 doi: 10.1002/lpor.v8.6
[17]
He L, Liu Y, Galland C, et al. A high-efficiency nonuniform grating coupler realized with 248-nm optical lithography. IEEE Photon Technol Lett, 2013, 25: 1358 doi: 10.1109/LPT.2013.2265911
[18]
Jin Y J, Xue C Y, Chou X J, et al. Highly efficient grating coupler between optical fiber and silicon-on-insulator waveguide. International Conference on Electronics and Optoelectronics (ICEOE), 2011, 2: 382 http://ieeexplore.ieee.org/document/6013262/
Fig. 1.  (Color online) The principle of grating coupling.

Fig. 2.  (Color online) The simulating schematic diagram of diffractive grating.

Fig. 3.  The simulation results of CEs for different etch periods.

Fig. 4.  (Color online) The diffraction field distributions with grating period of (a) 470 nm and (b) 620 nm.

Fig. 5.  The simulation results of CEs for different etch depth, the grating with a 620 nm period and 50% duty cycle.

Fig. 6.  (Color online) Example of test device for guided structure characterization.

Fig. 7.  The top-view SEM of our fabricated grating.

Fig. 8.  The simulation results of coupling efficiencies for different grating diffraction angle.

Fig. 9.  Experimental CE of the grating coupler for different wavelength at the C-band.

[1]
Sun C, Wade M T, Lee Y, et al. Single-chip microprocessor that communicates directly using light. Nature, 2015, 528: 534 doi: 10.1038/nature16454
[2]
Michel J, Liu J, Kimerling L C. High-performance Ge-on-Si photodetectors. Nat Photon, 2010, 4: 527 doi: 10.1038/nphoton.2010.157
[3]
Streshinsky M, Ding R, Liu Y, et al. Low power 50 Gb/s silicon traveling wave Mach-Zehnder modulator near 1300 nm. Opt Express, 2013, 21: 30350 doi: 10.1364/OE.21.030350
[4]
Li G, Yao J, Thacker H, et al. Ultralow-loss, high-density SOI optical waveguide routing for macro-chip interconnects. Opt Express, 2012, 20: 12035 doi: 10.1364/OE.20.012035
[5]
Van Laere F, Roelkens G, Ayre M, et al. Compact and highly efficient grating couplers between optical fiber and nanophotonic waveguides. J Lightwave Technol, 2007, 25: 151 doi: 10.1109/JLT.2006.888164
[6]
Taillaert D, Van Laere F, Ayre M, et al. Grating couplers for coupling between optical fibers and nanophotonic waveguides. Jpn J Appl Phys, 2006, 45: 6071 doi: 10.1143/JJAP.45.6071
[7]
Roelkens G, Dumon P, Bogaerts W, et al. Efficient silicon-on-insulator fiber coupler fabricated using 248-nm-deep UV lithography. IEEE PTL, 2005, 17: 2613 doi: 10.1109/LPT.2005.859132
[8]
Tsuchizawa T, Yamada K, Fukuda H, et al. Microphotonics devices based on silicon microfabrication technology. IEEE JSTQE, 2005, 11: 232 http://ieeexplore.ieee.org/document/1395912/
[9]
Roelkens G, Van Thourhout D, Baets R, et al. High efficiency silicon-on-insulator grating coupler based on a poly-silicon overlay. Opt Express, 2006, 14: 11622 doi: 10.1364/OE.14.011622
[10]
Vermeulen D, Selvaraja S, Verheyen P, et al. High-efficiency fiber-to-chip grating couplers realized using an advanced CMOS compatible silicon-on-insulator platform. Opt Express, 2014, 18: 18278 https://www.osapublishing.org/oe/abstract.cfm?uri=oe-18-17-18278
[11]
Yang S, Zhang Y, Baehr-Jones T, et al. High efficiency germanium-assisted grating coupler. Opt Express, 2014, 22: 30607 doi: 10.1364/OE.22.030607
[12]
Ding Y, Ou H, Peucheret C, et al. Fully-etched apodized fiber-tochip grating coupler on the SOI platform with-0.78 dB coupling efficiency using photonic crystals and bonded Al mirror. European Conference on Optical Communications, 2014: P.2.4 http://ieeexplore.ieee.org/abstract/document/6963889/
[13]
Ding Y, Peucheret C, Ou H, et al. Fully etched apodized grating coupler on the SOI platform with 0.58 dB coupling efficiency. Opt Lett, 2014, 39: 5348 doi: 10.1364/OL.39.005348
[14]
Zaoui W S, Kunze A, Vogel W, et al. Bridging the gap between optical fibers and silicon photonic integrated circuits. Opt Express, 2014, 22: 1277 doi: 10.1364/OE.22.001277
[15]
Zaoui W S, Kunze A, Vogel W, et al. CMOS-compatible polarization splitting grating couplers with a backside metal mirror. IEEE Photon Technol Lett, 2013, 25: 1395 doi: 10.1109/LPT.2013.2266132
[16]
Benedikovic D, Cheben P, Schmid J H, et al. High-efficiency single etch step apodized surface grating coupler using subwavelength structure. Laser Photonics Rev, 2014, 8: L93 doi: 10.1002/lpor.v8.6
[17]
He L, Liu Y, Galland C, et al. A high-efficiency nonuniform grating coupler realized with 248-nm optical lithography. IEEE Photon Technol Lett, 2013, 25: 1358 doi: 10.1109/LPT.2013.2265911
[18]
Jin Y J, Xue C Y, Chou X J, et al. Highly efficient grating coupler between optical fiber and silicon-on-insulator waveguide. International Conference on Electronics and Optoelectronics (ICEOE), 2011, 2: 382 http://ieeexplore.ieee.org/document/6013262/

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    Received: 02 September 2016 Revised: 02 November 2016 Online: Published: 01 May 2017

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      Rongrui Liu, Yubing Wang, Dongdong Yin, Han Ye, Xiaohong Yang, Qin Han. A high-efficiency grating coupler between single-mode fiber and silicon-on-insulator waveguide[J]. Journal of Semiconductors, 2017, 38(5): 054007. doi: 10.1088/1674-4926/38/5/054007 ****R R Liu, Y B Wang, D D Yin, H Ye, X H Yang, Q Han. A high-efficiency grating coupler between single-mode fiber and silicon-on-insulator waveguide[J]. J. Semicond., 2017, 38(5): 054007. doi: 10.1088/1674-4926/38/5/054007.
      Citation:
      Rongrui Liu, Yubing Wang, Dongdong Yin, Han Ye, Xiaohong Yang, Qin Han. A high-efficiency grating coupler between single-mode fiber and silicon-on-insulator waveguide[J]. Journal of Semiconductors, 2017, 38(5): 054007. doi: 10.1088/1674-4926/38/5/054007 ****
      R R Liu, Y B Wang, D D Yin, H Ye, X H Yang, Q Han. A high-efficiency grating coupler between single-mode fiber and silicon-on-insulator waveguide[J]. J. Semicond., 2017, 38(5): 054007. doi: 10.1088/1674-4926/38/5/054007.

      A high-efficiency grating coupler between single-mode fiber and silicon-on-insulator waveguide

      DOI: 10.1088/1674-4926/38/5/054007

      • State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, ewline Beijing 100083, China

      Funds:

      the National Natural Foundation of China 61274069

      the National Natural Foundation of China Nos.61674136

      the High-Tech Research and Development Program of China 2015AA016902

      the National Key Research and Development Program of China No.2016YFB0402404

      Project supported by the National Key Research and Development Program of China (No.2016YFB0402404), the High-Tech Research and Development Program of China (Nos.2013AA031401, 2015AA016902, 2015AA016904), and the National Natural Foundation of China (Nos.61674136, 61435002, 61176053, 61274069)

      the High-Tech Research and Development Program of China Nos.2013AA031401

      the National Natural Foundation of China 61435002

      the National Natural Foundation of China 61176053

      the High-Tech Research and Development Program of China 2015AA016904

      More Information
      • Corresponding author: Han Qin, Email: hanqin@semi.ac.cn
      • Received Date: 2016-09-02
      • Revised Date: 2016-11-02
      • Published Date: 2017-05-01

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